UK-based UV curing systems manufacturer GEW has launched its new EOS power and control platform which will roll out at LOUPE Americas in Chicago this week.
EOS replaces the company’s Rhino Power infrastructure and introduces a redesigned architecture covering power supplies, control electronics, cabling and UV system control software. GEW said the platform is designed to provide greater efficiency and modularity, while its in-house manufacturing approach supports quality control and technical expertise.
The EOS platform also features intelligent, serialised lampheads, which GEW said enable improved telemetry and expanded options for original equipment manufacturer (OEM) integration. The system is also designed to support serviceability and modern communication protocols.
Standard reporting features include hour and reflector counters, while enhanced remote monitoring capabilities are intended to provide users with greater visibility of system performance. EOS remains compatible with GEW’s patented interchangeable ArcLED technology and adds end-to-end encryption for communications traffic.
Robert Rae, managing director at GEW, said: “EOS will completely transform the functionality, capability and integration of our UV curing systems. It brings a more seamless and ergonomic operator experience, and its superb connectivity enables a huge variety of control and I/O options to be integrated, creating more telemetry and data for enhanced analyses.”
Alongside EOS, GEW is showcasing its DoseGuard precision control system and Air Blast Cooler at LOUPE Americas.
Mr Rae added: “The diverse range of key product innovations we have to offer at LOUPE Americas makes a stop at our booth an absolute must for every visitor.”
